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Spectroscopic characterization of acid mobility in 248-nm chemically amplified resists.
Abstract   Peer reviewed

Spectroscopic characterization of acid mobility in 248-nm chemically amplified resists.

G. J. Blanchard, J. L. Jessop, S. N. Goldie and Alec B. Scranton
Abstracts of Papers of the American Chemical Society, Vol.219, p.57-PMSE
03/01/2000

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Chemical Engineering

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