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17.1%-Efficient multi-scale-textured black silicon solar cells without dielectric antireflection coating
Conference proceeding

17.1%-Efficient multi-scale-textured black silicon solar cells without dielectric antireflection coating

Fatima Toor, Matthew R Page, Howard M Branz and Hao-Chih Yuan
2011 37th IEEE Photovoltaic Specialists Conference, pp.000020-000024
06/2011
DOI: 10.1109/PVSC.2011.6185835
url
https://www.osti.gov/servlets/purl/1019151View
Open Access

Abstract

In this work we present 17.1%-efficient p-type single crystal Si solar cells with a multi-scale-textured surface and no dielectric antireflection coating. Multi-scale texturing is achieved by a gold-nanoparticle-assisted nanoporous etch after conventional micron scale KOH-based pyramid texturing (pyramid black etching). By incorporating geometric enhancement of antireflection, this multi-scale texturing reduces the nanoporosity depth required to make silicon `black' compared to nanoporous planar surfaces. As a result, it improves short-wavelength spectral response (blue response), previously one of the major limiting factors in `black-Si' solar cells. With multi-scale texturing, the spectrum-weighted average reflectance from 350- to 1000-nm wavelength is below 2% with a 100-nm deep nanoporous layer. In comparison, roughly 250-nm deep nanopores are needed to achieve similar reflectance on planar surface. Here, we characterize surface morphology, reflectivity and solar cell performance of the multi-scale textured solar cells.
Photovoltaic Cells Surface Waves Optical surface waves Silicon Surface morphology Surface texture Surface treatment

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