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A Photochemical Method to Eliminate Oxygen Inhibition in Photocured Systems
Conference proceeding   Peer reviewed

A Photochemical Method to Eliminate Oxygen Inhibition in Photocured Systems

L. Gou and Alec B. Scranton
RadTech presents UV & EB 2004 Technology Expo & Conference : May 2-5, 2004, Charlotte Convention Center, Charlotte, NC, USA : technical conference proceedings
Charlotte, NC, United States
2004

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Abstract

Chemical Engineering

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