Characterizing acid mobility in chemically amplified resists via spectroscopic methods

Conference proceeding

Peer reviewed

Julie L. Jessop, Scott N. Goldie, Alec B. Scranton and Gary J. Blanchard

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March, 1999, Santa Clara, California, (1), pp.914-922

Proceedings of SPIE--the International Society for Optical Engineering, 3678

XVI (Santa Clara, California, United States, 03/15/1999–03/17/1999)

03/14/1999

DOI: 10.1117/12.350279

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Chemical Engineering

Title: Subtitle: Characterizing acid mobility in chemically amplified resists via spectroscopic methods
Creators: Julie L. Jessop
Scott N. Goldie
Alec B. Scranton
Gary J. Blanchard
Resource Type: Conference proceeding
Publication Details: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March, 1999, Santa Clara, California, (1), pp.914-922
Conference: XVI (Santa Clara, California, United States, 03/15/1999–03/17/1999)
Series: Proceedings of SPIE--the International Society for Optical Engineering; 3678
DOI: 10.1117/12.350279
ISSN: 0277-786x
Language: English
Date published: 03/14/1999
Academic Unit: Chemical and Biochemical Engineering
Record Identifier: 9983557248502771

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