Conference proceeding
New lithographic techniques for x-ray spectroscopy
Proceedings of SPIE - The International Society for Optical Engineering, Vol.9905, pp.990524-990524-10
07/18/2016
DOI: 10.1117/12.2232072
Abstract
Off-plane reflection gratings require high-fidelity, custom groove profiles to perform with high spectral resolution in a Wolter-I optical system. This places a premium on exploring lithographic techniques in nanofabrication to produce state-of-the-art gratings. The fabrication recipe currently being pursued involves electron-beam lithography (EBL) and reactive ion etching (RIE) to define the groove profile, wet anisotropic etching in silicon to achieve blazed grooves and UV-nanoimprint lithography (UV-NIL) to replicate the final product. A process involving grayscale EBL and thermal reflow known as thermally activated selective topography equilibration (TASTE) is also being investigated as an alternative method to fabricate these gratings. However, a master grating fabricated entirely in soft polymeric resist through the TASTE process requires imprinting procedures other than UV-NIL to explored. A commerically available process called substrate conformal imprint lithography (SCIL) has been identified as a possible solution to this problem. SCIL also has the ability to replicate etched silicon gratings with reduced trapped air defects as compared to UV-NIL, where it is difficult to achieve conformal contact over large areas. As a result, SCIL has the potential to replace UV-NIL in the current grating fabrication recipe.
Details
- Title: Subtitle
- New lithographic techniques for x-ray spectroscopy
- Creators
- Jake McCoy - Pennsylvania State UniversityRandall McEntaffer - Pennsylvania State UniversityCasey DeRoo - Harvard University
- Contributors
- Jan-Willem A den Herder (Editor) - SRON Netherlands Institute for Space ResearchTadayuki Takahashi (Editor) - Japan Aerospace Exploration AgencyMarshall Bautz (Editor) - Massachusetts Institute of Technology
- Resource Type
- Conference proceeding
- Publication Details
- Proceedings of SPIE - The International Society for Optical Engineering, Vol.9905, pp.990524-990524-10
- Publisher
- SPIE
- DOI
- 10.1117/12.2232072
- ISSN
- 0277-786X
- eISSN
- 1996-756X
- Language
- English
- Date published
- 07/18/2016
- Academic Unit
- Physics and Astronomy; University College Courses
- Record Identifier
- 9984199830302771
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