- Title: Subtitle
- Optimal sampling strategies for sub-100-nm overlay
- Creators
- Bharath RangarajanMichael K. TempletonLuigi CapodieciRamkumar SubramanianAlec B. Scranton
- Resource Type
- Conference proceeding
- Publication Details
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering, v. 3332), (1), pp.348-359
- Conference
- 3332 (Santa Clara, CA, United States)
- DOI
- 10.1117/12.308743
- ISSN
- 0277-786X
- Language
- English
- Date published
- 06/08/1998
- Academic Unit
- Chemical and Biochemical Engineering
- Record Identifier
- 9983557545002771
Conference proceeding
Optimal sampling strategies for sub-100-nm overlay
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California (Proceedings of SPIE--the International Society for Optical Engineering, v. 3332), (1), pp.348-359
3332 (Santa Clara, CA, United States)
06/08/1998
DOI: 10.1117/12.308743
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