Sign in
Spectroscopic characterization of acid generation and concentration and free volume evolution in chemically amplified resists
Conference proceeding   Peer reviewed

Spectroscopic characterization of acid generation and concentration and free volume evolution in chemically amplified resists

J. L. Jessop, S. N. Goldie, G. J. Blanchard and Alec B. Scranton
Papers from the Sixth International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, 22-26 April 2001, Napa Valley, California (Journal of vacuum science & technology, B, v. 20, no. 1), (1), pp.219-225
20 (Napa Valley, CA, United States)
2002

View Online

Abstract

Chemical Engineering

Details

Metrics

11 Record Views