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Spectroscopic characterization of acid mobility in chemically amplified resists
Conference proceeding   Peer reviewed

Spectroscopic characterization of acid mobility in chemically amplified resists

Julie L. Jessop, Gary J. Blanchard, Scott N. Goldie and Alec B. Scranton
Advances in Resist Technology and Processing XVII : 28 February - 1 March 2000, Santa Clara, USA (Proceedings of SPIE - The International Society for Optical Engineering, 3999-2), (1), pp.161-170
3999 (Santa Clara, California, United States)
02/27/2000
DOI: 10.1117/12.388299

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Abstract

Chemical Engineering

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