Direct writing of sub-5 nm hafnium diboride metallic nanostructures

Wei Ye; Pamela A Peña Martin; Navneet Kumar; Scott R Daly; Angus A Rockett; John R Abelson; Gregory S Girolami; Joseph W Lyding

doi:10.1021/nn1018522

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Direct writing of sub-5 nm hafnium diboride metallic nanostructures

Journal article

Peer reviewed

Direct writing of sub-5 nm hafnium diboride metallic nanostructures

Wei Ye, Pamela A Peña Martin, Navneet Kumar, Scott R Daly, Angus A Rockett, John R Abelson, Gregory S Girolami and Joseph W Lyding

ACS nano, Vol.4(11), pp.6818-6824

2010

DOI: 10.1021/nn1018522

PMID: 20964393

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Abstract

Sub-5 nm metallic hafnium diboride (HfB(2)) nanostructures were directly written onto Si(100)-2 × 1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam induced deposition (EBID) of a carbon-free precursor molecule, tetrakis(tetrahydroborato)hafnium, Hf(BH(4))(4). Scanning tunneling spectroscopy data confirm the metallic nature of the HfB(2) nanostructures, which have been written down to lateral dimensions of ∼2.5 nm. To our knowledge, this is the first demonstration of sub-5 nm metallic nanostructures in an STM-EBID experiment.

Details

Title: Subtitle: Direct writing of sub-5 nm hafnium diboride metallic nanostructures
Creators: Wei Ye
Pamela A Peña Martin
Navneet Kumar
Scott R Daly
Angus A Rockett
John R Abelson
Gregory S Girolami
Joseph W Lyding
Resource Type: Journal article
Publication Details: ACS nano, Vol.4(11), pp.6818-6824
DOI: 10.1021/nn1018522
PMID: 20964393
NLM abbreviation: ACS Nano
ISSN: 1936-086X
eISSN: 1936-086X
Language: English
Date published: 2010
Academic Unit: Chemistry
Record Identifier: 9983985993802771

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