Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

S. W Schmucker; N Kumar; J. R Abelson; S. R Daly; G. S Girolami; M. R Bischof; D. L Jaeger; R. F Reidy; B. P Gorman; J Alexander; J. B Ballard; J. N Randall; J. W Lyding

doi:10.1038/ncomms1907

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Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

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Open access

Peer reviewed

Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

S. W Schmucker, N Kumar, J. R Abelson, S. R Daly, G. S Girolami, M. R Bischof, D. L Jaeger, R. F Reidy, B. P Gorman, J Alexander, …

Nature communications, Vol.3(1), pp.935-935

2012

DOI: 10.1038/ncomms1907

PMID: 22760634

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Abstract

Scanning probe microscopy and related techniques rely on the availability of very sharp tips. Here, a sharpening technique based on field-directed sputtering is demonstrated, resulting in ultrasharp metallic tips for use in scanning tunnelling microscopy as well as atomic-scale lithographic experiments.

Details

Title: Subtitle: Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography
Creators: S. W Schmucker
N Kumar
J. R Abelson
S. R Daly
G. S Girolami
M. R Bischof
D. L Jaeger
R. F Reidy
B. P Gorman
J Alexander
J. B Ballard
J. N Randall
J. W Lyding
Resource Type: Journal article
Publication Details: Nature communications, Vol.3(1), pp.935-935
DOI: 10.1038/ncomms1907
PMID: 22760634
ISSN: 2041-1723
eISSN: 2041-1723
Language: English
Date published: 2012
Academic Unit: Chemistry
Record Identifier: 9983985856402771

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