Journal article
Growth Inhibition to Enhance Conformal Coverage in Thin Film Chemical Vapor Deposition
Journal of the American Chemical Society, Vol.130(52), pp.17660-17661
12/31/2008
DOI: 10.1021/ja807802r
PMID: 19067582
Abstract
We introduce the use of a growth inhibitor to enhance thin film conformality in low temperature chemical vapor deposition. Films of TiB2 grown from the single source precursor Ti(BH4)3(dme) are much more highly conformal when grown in the presence of one of the film growth byproducts, 1,2-dimethoxyethane (dme). This effect can be explained in terms of two alternative inhibitory mechanisms: one involving blocking of surface reactive sites, which is equivalent to reducing the rate of the forward reaction leading to film growth, the other analogous to Le Chatelier’s principle, in which the addition of a reaction product increases the rate of the back reaction. The reduction in growth rate corresponds to a reduction in the sticking probability of the precursor, which enhances conformality by enabling the precursor to diffuse deeper into a recessed feature before it reacts.
Details
- Title: Subtitle
- Growth Inhibition to Enhance Conformal Coverage in Thin Film Chemical Vapor Deposition
- Creators
- Navneet KumarAngel Yanguas-GilScott R DalyGregory S GirolamiJohn R Abelson
- Resource Type
- Journal article
- Publication Details
- Journal of the American Chemical Society, Vol.130(52), pp.17660-17661
- Publisher
- American Chemical Society
- DOI
- 10.1021/ja807802r
- PMID
- 19067582
- ISSN
- 0002-7863
- eISSN
- 1520-5126
- Language
- English
- Date published
- 12/31/2008
- Academic Unit
- Chemistry
- Record Identifier
- 9983985888902771
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