Journal article
Influences of ultrasonic vibration on morphology and photoelectric properties of F-doped SnO2 thin films during laser annealing
Applied surface science, Vol.458, pp.940-948
11/15/2018
DOI: 10.1016/j.apsusc.2018.07.177
Abstract
[Display omitted]
•Laser annealing with ultrasonic vibration was developed to improve FTO film quality.•The influences of vibration frequency and vibration power were investigated.•Vibration frequency and power were crucial to optimize performance of the FTO films.•Laser annealing with ultrasonic vibration outperformed pure laser annealing.•The FTO film obtained by using 48 kHz and 300 W showed the highest figure of merit.
An effective strategy, i.e. laser annealing coupled with ultrasonic vibration, was developed to improve morphology and photoelectric properties of F-doped SnO2 (FTO) thin films. The influences of vibration frequency and power were investigated by X-ray diffractometer (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), UV–Vis spectrophotometer and digital four-point probe instrument. Pure laser annealing was also carried out for comparison. The results suggested that laser annealing coupled with ultrasonic vibration, rather than pure laser annealing, could significantly facilitate oriented grain growth, reduce film residual stress, enhance film compactness and uniformity, decrease film surface roughness and thickness, and thus improve photoelectric properties of the films. It was noteworthy that the appropriate vibration frequency and power were crucial to optimize the performance of the FTO films. In the present work, laser annealing coupled with ultrasonic vibration of 48 kHz and 300 W could achieve the optimal photoelectric properties of the FTO film with the highest average transmittance of 85.3% and the lowest sheet resistance of 8.8 Ω/sq, and thus yield the maximum figure of merit of 2.32 × 10−2 Ω−1, compared to 1.13 × 10−2 Ω−1 for the original FTO film and 1.29 × 10−2 Ω−1 for the pure laser-annealed FTO film. These results may provide a scientific basis and reference for performance optimization of transparent conducting oxide (TCO) films, and are believed to attract more interests of scientists in the research areas of TCO films and related optoelectronic applications.
Details
- Title: Subtitle
- Influences of ultrasonic vibration on morphology and photoelectric properties of F-doped SnO2 thin films during laser annealing
- Creators
- Bao-jia Li - Jiangsu UniversityYong-ying Wang - School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013, PR ChinaLi-jing Huang - School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, PR ChinaHai-di Cao - Jiangsu UniversityQinghua Wang - University of IowaHongtao Ding - University of IowaNai-fei Ren - School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, PR China
- Resource Type
- Journal article
- Publication Details
- Applied surface science, Vol.458, pp.940-948
- DOI
- 10.1016/j.apsusc.2018.07.177
- ISSN
- 0169-4332
- eISSN
- 1873-5584
- Publisher
- Elsevier B.V
- Grant note
- DOI: 10.13039/501100001809, name: National Natural Science Foundation of China, award: 61405078; DOI: 10.13039/501100002949, name: Science and Technology Planned Project of Jiangsu Province of China, award: BE2015037; DOI: 10.13039/501100004608, name: Natural Science Foundation of Jiangsu Province of China, award: BK20140567; DOI: 10.13039/501100002858, name: China Postdoctoral Science Foundation, award: 2015T80522, 2014M560398, 2016M600367; name: Overseas Studies, award: JS-2016-095
- Language
- English
- Date published
- 11/15/2018
- Academic Unit
- Mechanical Engineering
- Record Identifier
- 9984196522402771
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