Journal article
Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio
Lab on a chip, Vol.9(14), pp.1994-1996
01/01/2009
DOI: 10.1039/b904769g
PMID: 19568665
Abstract
A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to similar to 1 while in an inexpensive and convenient manner.
Details
- Title: Subtitle
- Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio
- Creators
- Xuan Mu - Tsinghua UniversityQionglin Liang - Tsinghua UniversityPing Hu - East China University of Science and TechnologyKangning Ren - Tsinghua UniversityYiming Wang - Tsinghua UniversityGuoan Luo - Tsinghua University
- Resource Type
- Journal article
- Publication Details
- Lab on a chip, Vol.9(14), pp.1994-1996
- Publisher
- Royal Soc Chemistry
- DOI
- 10.1039/b904769g
- PMID
- 19568665
- ISSN
- 1473-0197
- eISSN
- 1473-0189
- Number of pages
- 3
- Grant note
- 20080031012 / Ministry of Education of China; Ministry of Education, China 2007CB714505 / National Basic Research Program (973 Program) of China; National Basic Research Program of China
- Language
- English
- Date published
- 01/01/2009
- Academic Unit
- Roy J. Carver Department of Biomedical Engineering
- Record Identifier
- 9984276453302771
Metrics
8 Record Views