Journal article
Lanthanide N,N-Dimethylaminodiboranates: Highly Volatile Precursors for the Deposition of Lanthanide-Containing Thin Films
Journal of the American Chemical Society, Vol.132(7), pp.2106-2107
02/24/2010
DOI: 10.1021/ja9098005
PMID: 20108908
Abstract
New lanthanide CVD precursors of stoichiometry Ln(H3BNMe2BH3)3 have been prepared, where Ln = La, Ce, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, and Lu. The ligand is N,N-dimethylaminodiboranate, a new kind of multidentate borohydride. The structures of the Ln(H3BNMe2BH3)3 complexes are highly dependent on the size of the lanthanide ions: the coordination number decreases from Pr (CN = 14) to Sm (CN = 13) to Er (CN = 12) corresponding with the decrease in ionic radii. The Ln(H3BNMe2BH3)3 complexes are highly volatile and sublime at temperatures as low as 65 °C in vacuum. These complexes are useful CVD precursors; for example, Y(H3BNMe2BH3)3 has been used to deposit Y2O3 on silicon at 300 °C by CVD using water as a coreactant.
Details
- Title: Subtitle
- Lanthanide N,N-Dimethylaminodiboranates: Highly Volatile Precursors for the Deposition of Lanthanide-Containing Thin Films
- Creators
- Scott R DalyDo Young KimYu YangJohn R AbelsonGregory S Girolami
- Resource Type
- Journal article
- Publication Details
- Journal of the American Chemical Society, Vol.132(7), pp.2106-2107
- Publisher
- American Chemical Society
- DOI
- 10.1021/ja9098005
- PMID
- 20108908
- ISSN
- 0002-7863
- eISSN
- 1520-5126
- Language
- English
- Date published
- 02/24/2010
- Academic Unit
- Chemistry
- Record Identifier
- 9983985874902771
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