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Limiting Spectral Resolution of a Reflection Grating Made via Electron-beam Lithography
Journal article   Open access   Peer reviewed

Limiting Spectral Resolution of a Reflection Grating Made via Electron-beam Lithography

Casey T. DeRoo, Jared Termini, Fabien Grise, Randall L. McEntaffer, Benjamin D. Donovan and Chad Eichfeld
The Astrophysical journal, Vol.904(2), p.142
12/01/2020
DOI: 10.3847/1538-4357/abbe15
url
https://doi.org/10.3847/1538-4357/abbe15View
Published (Version of record) Open Access

Abstract

Gratings enable dispersive spectroscopy from the X-ray to the optical, and feature prominently in proposed flagships and SmallSats alike. The exacting performance requirements of these future missions necessitate assessing whether the present state-of-the-art in grating manufacture will limit spectrometer performance. In this work, we manufacture a 1.5 mm thick, 1000 nm period (1000 gr mm(-1)) flat grating using electron-beam lithography (EBL), a promising lithographic technique for patterning gratings for future astronomical observatories. We assess the limiting spectral resolution of this grating by interferometrically measuring the diffracted wavefronts produced in first order. Our measurements show this grating has a performance of at least R similar to 14,600, and that our assessment is bounded by the error of our interferometric measurement. The impact of EBL stitching error on grating performance is quantified, and a path to measuring the period error of customized, curved gratings is presented.
Astronomy & Astrophysics Physical Sciences Science & Technology

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