Journal article
Particle growth in a sputtering discharge
Journal of vacuum science & technology. A, Vacuum, surfaces, and films, Vol.17(5), pp.2835-2840
09/01/1999
DOI: 10.1116/1.581951
Abstract
Submicron to micron size particles are produced in the gas phase of sputtering discharges. These particles can contaminate thin films grown by sputter deposition. On the other hand, particle production in a discharge can be desirable when used for manufacturing fine powders. Here, experimental results are presented demonstrating particle production in an argon discharge, using a variety of target materials. The rate of particle growth varied widely, depending on the target material. Particles grown to 300 nm–5 μm, usually have one of two different shapes. Compact particles with a nearly spherical shape were produced by sputtering graphite, titanium, tungsten, and stainless steel targets, while filamentary-shaped fractal particles formed when sputtering aluminum and copper targets. Particle growth was also observed for a target made of an insulating material.
Details
- Title: Subtitle
- Particle growth in a sputtering discharge
- Creators
- D. Samsonov - University of IowaJ. Goree - Department of Physics and Astronomy, The University of Iowa, Iowa City, Iowa 52242
- Resource Type
- Journal article
- Publication Details
- Journal of vacuum science & technology. A, Vacuum, surfaces, and films, Vol.17(5), pp.2835-2840
- DOI
- 10.1116/1.581951
- ISSN
- 0734-2101
- eISSN
- 1520-8559
- Number of pages
- 6
- Grant note
- NASA
- Language
- English
- Date published
- 09/01/1999
- Academic Unit
- Physics and Astronomy; Mechanical Engineering
- Record Identifier
- 9984429041102771
Metrics
4 Record Views