Journal article
Quercitrin protects skin from UVB-induced oxidative damage
Toxicology and applied pharmacology, Vol.269(2), pp.89-99
06/01/2013
DOI: 10.1016/j.taap.2013.03.015
PMCID: PMC3700335
PMID: 23545178
Abstract
Exposure of the skin to ultraviolet B (UVB) radiation causes oxidative damage to skin, resulting in sunburn, photoaging, and skin cancer. It is generally believed that the skin damage induced by UV irradiation is a consequence of generation of reactive oxygen species (ROS). Recently, there is an increased interest in the use of natural products as chemopreventive agents for non-melanoma skin cancer (NMSC) due to their antioxidants and anti-inflammatory properties. Quercitrin, glycosylated form of quercetin, is the most common flavonoid in nature with antioxidant properties. The present study investigated the possible beneficial effects of quercitrin to inhibit UVB irradiation-induced oxidative damage in vitro and in vivo. Our results showed that quercitrin decreased ROS generation induced by UVB irradiation in JB6 cells. Quercitrin restored catalase expression and GSH/GSSG ratio reduced by UVB exposure, two major antioxidant enzymes, leading to reductions of oxidative DNA damage and apoptosis and protection of the skin from inflammation caused by UVB exposure. The present study demonstrated that quercitrin functions as an antioxidant against UVB irradiation-induced oxidative damage to skin.
•Oxidative stress plays a key role in UV-induced cell and tissue injuries.•Quercitrin decreases ROS generation and restores antioxidants irradiated by UVB.•Quercitrin reduces UVB-irradiated oxidative DNA damage, apoptosis, and inflammation.•Quercitrin functions as an antioxidant against UVB-induced skin injuries.
Details
- Title: Subtitle
- Quercitrin protects skin from UVB-induced oxidative damage
- Creators
- Yuanqin Yin - China Medical University (PRC)Wenqi Li - University of KentuckyYoung-Ok Son - University of KentuckyLijuan Sun - University of KentuckyJian Lu - University of KentuckyDonghern Kim - University of KentuckyXin Wang - University of KentuckyHua Yao - Zhejiang UniversityLei Wang - University of KentuckyPoyil Pratheeshkumar - University of KentuckyAndrew J Hitron - University of KentuckyJia Luo - University of KentuckyNing Gao - Department of Pharmacognos, College of Pharmacy, 3rd Military Medical University, Chongqing, ChinaXianglin Shi - University of KentuckyZhuo Zhang - University of Kentucky
- Resource Type
- Journal article
- Publication Details
- Toxicology and applied pharmacology, Vol.269(2), pp.89-99
- DOI
- 10.1016/j.taap.2013.03.015
- PMID
- 23545178
- PMCID
- PMC3700335
- NLM abbreviation
- Toxicol Appl Pharmacol
- ISSN
- 0041-008X
- eISSN
- 1096-0333
- Publisher
- Elsevier Inc
- Language
- English
- Date published
- 06/01/2013
- Academic Unit
- Pathology
- Record Identifier
- 9984201247002771
Metrics
13 Record Views