Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists

Deirdre Olynick; J Liddle; Alexei Tivanski; Mary Gilles; Tolek Tyliszczak; Farhad Salmassi; Kathy Liang; Stephen Leone

doi:10.1116/1.2395957

Journal article

Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists

Deirdre Olynick, J Liddle, Alexei Tivanski, Mary Gilles, Tolek Tyliszczak, Farhad Salmassi, Kathy Liang and Stephen Leone

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, Vol.24(6), pp.3048-3054

11/30/2006

DOI: 10.1116/1.2395957

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https://www.osti.gov/biblio/901516View

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Abstract

Electron-beam exposed hydrogen silsesquioxane cross-linking chemistry is investigated by scanning transmission x-ray microscopy (STXM) and atomic force microscopy (AFM). Using STXM, a maximum in the chemical contrast is obtained by measuring the x-ray absorption at 535.4 eV , corresponding to the 1 s K -edge transition in oxygen. An area-dependent and dose-dependent chemical conversion is observed for feature sizes between 150 nm and 10 μ m and doses between 0.4 and 40 mC ∕ cm 2 . The activated (cross-linked) regions extend beyond the exposure zones, especially for higher dosed exposures. With AFM, thickness changes in the latent images (e-beam exposed but undeveloped) are observed, which also display a dependence on exposed area. Potential mechanisms, involving chemical diffusion outside the exposure zone, are discussed.

Details

Title: Subtitle: Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists
Creators: Deirdre Olynick - Lawrence Berkeley National Laboratory, Molecular Foundry, Mail Stop 67-2206, One Cyclotron Rd., Berkeley, California 94720
J Liddle - Lawrence Berkeley National Laboratory, Molecular Foundry, Mail Stop 67-2206, One Cyclotron Rd., Berkeley, California 94720
Alexei Tivanski - Lawrence Berkeley National Laboratory, Chemical Sciences Division, Mail Stop 6-2100, One Cyclotron Rd., Berkeley, California 94720
Mary Gilles - Lawrence Berkeley National Laboratory, Chemical Sciences Division, Mail Stop 6-2100, One Cyclotron Rd., Berkeley, California 94720
Tolek Tyliszczak - Lawrence Berkeley National Laboratory, Advanced Light Source, Mail Stop,One Cyclotron Rd., Berkeley, California 94720
Farhad Salmassi - Lawrence Berkeley National Laboratory, Center for X-ray Optics, Mail Stop 2-400, One Cyclotron Rd., Berkeley, California 94720
Kathy Liang - Lawrence Berkeley National Laboratory, Chemical Sciences Division, Berkeley, California 94720; Department of Chemistry, University of California, Berkeley, California 94720; and Department of Physics, University of California, Berkeley, California 94720
Stephen Leone - Lawrence Berkeley National Laboratory, Chemical Sciences Division, Berkeley, California 94720; Department of Chemistry, University of California, Berkeley, California 94720; and Department of Physics, University of California, Berkeley, California 94720
Resource Type: Journal article
Publication Details: Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, Vol.24(6), pp.3048-3054
DOI: 10.1116/1.2395957
ISSN: 1071-1023
eISSN: 1520-8567
Publisher: American Vacuum Society
Grant note: NSF DE-AC02-05CH11231 / DOE
Date published: 11/30/2006
Academic Unit: Chemistry
Record Identifier: 9984216561102771

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