Copper-assisted, anti-reflection etching of silicon surfaces

Fatima Toor; Howard M Branz

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Copper-assisted, anti-reflection etching of silicon surfaces

Patent

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Copper-assisted, anti-reflection etching of silicon surfaces

Fatima Toor and Howard M Branz

European Patent Office

10/28/2015

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https://patentscope.wipo.int/search/en/detail.jsf?docId=EP129886331View

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Abstract

A method (300) for etching a silicon surface (116) to reduce reflectivity. The method (300) includes electroless deposition of copper nanoparticles about 20 nanometers in size on the silicon surface (116), with a particle-to-particle spacing of 3 to 8 nanometers. The method (300) includes positioning (310) the substrate (112) with a silicon surface (116) into a vessel (122). The vessel (122) is filled (340) with a volume of an etching solution (124) so as to cover the silicon surface (116). The etching solution (124) includes an oxidant-etchant solution (146), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The silicon surface (116) is etched (350) by agitating the etching solution (124) with, for example, ultrasonic agitation, and the etching may include heating (360) the etching solution (124) and directing light (365) onto the silicon surface (116). During the etching, copper nanoparticles enhance or drive the etching process.

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Details

Title: Subtitle: Copper-assisted, anti-reflection etching of silicon surfaces
Creators: Fatima Toor (Inventor) - University of Iowa, Electrical and Computer Engineering
Howard M Branz (Inventor) - National Renewable Energy Laboratory
Resource Type: Patent
Publisher: European Patent Office
Patent: EP2828895; B1; European Patent Organisation (Germany, Munich) - EPO; Published; 13764428; 03/11/2013
Translated title: KUPFERGESTÜTZTE ANTIREFLEXIVE ÄTZUNG VON SILICIUMOBERFLÄCHEN; GRAVURE ANTIREFLET DE SURFACES DE SILICIUM ASSISTÉE PAR DU CUIVRE
Alternative title: KUPFERGESTÜTZTE ANTIREFLEXIVE ÄTZUNG VON SILICIUMOBERFLÄCHEN; GRAVURE ANTIREFLET DE SURFACES DE SILICIUM ASSISTÉE PAR DU CUIVRE
Language: English; French; German
Date published: 10/28/2015
Academic Unit: Physics and Astronomy; Holden Comprehensive Cancer Center; Electrical and Computer Engineering; Iowa Technology Institute
Record Identifier: 9984240055402771

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